SynSur: An end-to-end generative pipeline for synthetic industrial surface defect generation and detection

· Source: cs.CV updates on arXiv.org · Field: Manufacturing & Industrial — Artificial Intelligence & Machine Learning, Smart Manufacturing & Industry 4.0, Quality Control & Standards · Depth: Expert, extended

Summary

SynSur is an end-to-end generative pipeline for synthetic industrial surface defect generation and detection, addressing the scarcity of labeled defect data. Developed by Fraunhofer IGD, it combines Vision-Language Model-based prompts, LoRA-adapted Flux.1-dev diffusion, mask-guided inpainting, and sample filtering with automatic label derivation via SAM 3. Evaluated on BSData (pitting defects on ball screw drives) and MSD (mobile phone screen scratches), the pipeline generates realistic defects. Experiments with YOLOv26, YOLOX, and LW-DETR show that synthetic-only training is inferior, but combining synthetic data with real data can preserve performance and yield modest gains, particularly for YOLO-style architectures. LoRA adaptation is crucial for domain-specific appearance matching, and cross-domain transfer requires careful adaptation.

Key takeaway

For AI Engineers developing industrial defect detection systems with limited real data, integrate synthetic data as an augmentation strategy rather than a full replacement. Focus on combining synthetic samples with your existing real datasets to achieve modest performance gains, especially with YOLO-style architectures. Ensure domain-specific adaptation, like LoRA fine-tuning and careful annotation quality control, for reliable results and cross-domain transferability.

Key insights

Synthetic data, when augmenting scarce real datasets, can improve industrial defect detection.

Principles

Method

The SynSur pipeline uses VLM-derived prompts, LoRA-adapted diffusion, mask-guided inpainting, DreamSim/CLIPScore filtering, and SAM 3 for automatic label derivation.

In practice

Topics

Code references

Best for: Computer Vision Engineer, Research Scientist, AI Scientist, Machine Learning Engineer, AI Engineer

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Editorial summary, takeaway, and curation by AIssential. Original article published by cs.CV updates on arXiv.org.